Evaporation materials and sputtering targets
For material research in the area of PVD thin-film technology, we provide high purity evaporation materials in the most varied forms and qualities – as granules, chips, tablets, wires and powders, in the form of pure metal, alloy, oxide, sulphide or fluoride.
We produce sputtering targets in a casting process or by means of powder metallurgy – you can find a list of the metal targets available as standard under Downloads.
In addition, the target geometry can also be produced in line with customer specifications; depending on the material properties, the maximum size can be up to a diameter of 200 mm. Of course, our delivery options also include metallic bonds and the production of back plates.
Sputtering targets made from other pure metals, alloys, oxides, carbides, nitrides and fluorides not mentioned here are also available. We would be happy to provide you with a quotation in accordance with your requirements with your specified composition, purity and dimensions.